To Study the ECR Plasma Assisted Growth of III-V Nitride (such as GaN) and Nanostructures

Download or read book To Study the ECR Plasma Assisted Growth of III-V Nitride (such as GaN) and Nanostructures written by Viswas Purohit and published by University of Pune, PhD Dissertation. This book was released on with total page 204 pages. Available in PDF, EPUB and Kindle. Book excerpt: RESEARCH THESIS by Viswas Purohit PhD, Plasma Physics University of Pune, MAH, India “To study the ECR assisted Growth of III-V nitride (such as GaN) and nanostructures”. • The aim of the work carried out was to design and develop a permanent magnet based Electron Cyclotron Resonance (ECR) plasma system as well as to study the plasma assisted material synthesis and modifications with the ECR plasma. Overall the aims were, a) Development of an ECR plasma system b) Carrying out plasma diagnostics using Langmuir double probe and Retarding field analyzer. c) Use of hollow cathode discharge for synthesizing metallic nanomaterials, which spawned two more projects in our department. d) Depositing GaN by MOCVD within an ECR plasma reactor.