Recent developments in microelectronics technologies have created a great demand for interlayer dielectric materials with a very low dielectric constant. They w

Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). Mor

Contains papers from a May 2000 symposium, representing the state of the art in areas of dielectric materials science and process integration. Papers are arrang