Aberration Corrected Photoemission Electron Microscopy with Photonics Applications

Aberration Corrected Photoemission Electron Microscopy with Photonics Applications
Author :
Publisher :
Total Pages : 263
Release :
ISBN-10 : OCLC:950741943
ISBN-13 :
Rating : 4/5 (43 Downloads)

Book Synopsis Aberration Corrected Photoemission Electron Microscopy with Photonics Applications by :

Download or read book Aberration Corrected Photoemission Electron Microscopy with Photonics Applications written by and published by . This book was released on 2015 with total page 263 pages. Available in PDF, EPUB and Kindle. Book excerpt: Photoemission electron microscopy (PEEM) uses photoelectrons excited from material surfaces by incident photons to probe the interaction of light with surfaces with nanometer-scale resolution. The point resolution of PEEM images is strongly limited by spherical and chromatic aberration. Image aberrations primarily originate from the acceleration of photoelectrons and imaging with the objective lens and vary strongly in magnitude with specimen emission characteristics. Spherical and chromatic aberration can be corrected with an electrostatic mirror, and here I develop a triode mirror with hyperbolic geometry that has two adjacent, field-adjustable regions. I present analytic and numerical models of the mirror and show that the optical properties agree to within a few percent. When this mirror is coupled with an electron lens, it can provide a large dynamic range of correction and the coefficients of spherical and chromatic aberration can be varied independently. I report on efforts to realize a triode mirror corrector, including design, characterization, and alignment in our microscope at Portland State University (PSU). PEEM may be used to investigate optically active nanostructures, and we show that photoelectron emission yields can be identified with diffraction, surface plasmons, and dielectric waveguiding. Furthermore, we find that photoelectron micrographs of nanostructured metal and dielectric structures correlate with electromagnetic field calculations. We conclude that photoemission is highly spatially sensitive to the electromagnetic field intensity, allowing the direct visualization of the interaction of light with material surfaces at nanometer scales and over a wide range of incident light frequencies.


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